The Symposium "New trends in advanced lithography and pattern transfer methods" is organised by NFFA-Europe Pilot and will be held virtually on May 30 (13.00 – 17.00) and May 31 (9.00 – 13.00). The main scope of the Symposium is to present and discuss the latest advances in ultra-high resolution lithography and methods of pattern transfer, that include advanced electron and ion beam patterning, methods of self-assembly, dry etching, deposition and other techniques.The deadline for the abstract submissions is extended until January 31, 2022.
Date: Monday 30, May2022 - 13:00h
End date: Tuesday 31, May2022 - 13:00h
Organiser: NFFA EUROPE Pilot