La actualidad del Parc

Descripción:

The Symposium "New trends in advanced lithography and pattern transfer methods" is organised by NFFA-Europe Pilot and will be held virtually on May 30 (13.00 – 17.00) and May 31 (9.00 – 13.00). The main scope of the Symposium is to present and discuss the latest advances in ultra-high resolution lithography and methods of pattern transfer, that include advanced electron and ion beam patterning, methods of self-assembly, dry etching, deposition and other techniques.

The deadline for the abstract submissions is extended until January 31, 2022.

Updated information about the event

Submit your abstracts 

Ubicación: Online

Fecha: Lunes 30, Mayo de 2022 - 13:00h

Fecha final: Martes 31, Mayo de 2022 - 13:00h

Organizador: NFFA EUROPE Pilot

Añadir a mi calendario 2022-05-30 13:00:00 2022-05-31 13:00:00 Europe/Madrid Symposium "New trends in advanced lithography and pattern transfer methods"

The Symposium "New trends in advanced lithography and pattern transfer methods" is organised by NFFA-Europe Pilot and will be held virtually on May 30 (13.00 – 17.00) and May 31 (9.00 – 13.00). The main scope of the Symposium is to present and discuss the latest advances in ultra-high resolution lithography and methods of pattern transfer, that include advanced electron and ion beam patterning, methods of self-assembly, dry etching, deposition and other techniques.

The deadline for the abstract submissions is extended until January 31, 2022.

Updated information about the event

Submit your abstracts 

Online NFFA EUROPE Pilot